Ballistic Electron Emission Microscopy (BEEM) is a type of electron microscopy that is used to study the electronic properties of thin films and heterostructures. BEEM is based on the measurement of the ballistic electrons that are emitted from a sample when it is subjected to a high electric field.
In BEEM, a thin metal film is deposited on a substrate, and a voltage is applied between the metal film and the substrate. The voltage creates an electric field that causes electrons to be emitted from the metal film. These electrons travel through the vacuum in a straight path, or ballistically, and are collected by a detector.
The electrons collected by the detector can be used to obtain information about the electronic properties of the metal film. For example, the current-voltage (I-V) characteristics of the metal film can be determined by measuring the current that is collected by the detector as a function of the voltage applied between the metal film and substrate.
BEEM is a powerful technique that can provide information about the electronic properties of thin films and heterostructures that is difficult to obtain with other techniques. For example, BEEM can be used to study the electronic transport properties of two-dimensional materials, such as graphene, as well as the electronic properties of interfaces between different materials.
Overall, BEEM is an important tool in the field of condensed matter physics and materials science and is used to study the electronic properties of a wide range of materials and devices. learn more about Learning Management System.
